Electron Beam Lithography Charge

Description

Electron beam lithography charge can become a significant process concern when patterns are written onto electrically insulating substrates. At DisChem, we address this challenge with DisCharge H2O, our water-based anti-charging agent for EBL. We developed it to create a conductive film over the resist, helping accumulated electrons dissipate during exposure. This can support better pattern shape, positional accuracy, and process consistency when working with substrates such as fused silica, quartz, SiO₂, and PDMS.