- Member Since: February 20, 2025
About Discheminc
Photoresist adhesion promoter
If your microstructures are suffering from peeling or undercutting during wet processing, our Photoresist adhesion promoter is here to help. At DisChem, we pride ourselves […]
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hydrogen silsesquioxane ebl resist
Unlock the full potential of your nanolithography process with our high-purity hydrogen silsesquioxane ebl resist. At DisChem, we offer this advanced silicon-based material to help […]
7 total views, 7 today
Sulfamate Nickel Plating Solution
Our sulfamate nickel plating solution is engineered to produce high-quality nickel deposits with excellent uniformity and low internal stress. We support electroforming and precision plating […]
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Direct Write Electron Beam Lithography
Our solutions for direct write electron beam lithography support precise pattern generation without the need for masks. We help researchers and engineers create complex nanoscale […]
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