- Member Since: February 20, 2025
About Discheminc
Electron Beam Lithography Charge
Electron beam lithography charge can become a significant process concern when patterns are written onto electrically insulating substrates. At DisChem, we address this challenge with […]
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HSQ Negative Resist
Our HSQ negative resist, H-SiQ, is formulated for high-resolution electron beam lithography applications. We use hydrogen silsesquioxane resin in a semiconductor-grade MIBK carrier solvent to […]
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